昇華性錯体を利用したCVD法による金属薄膜および酸化物薄膜の調製<ミニノート>

概要

論文の詳細を見る
A novel CVD system has been examined to deposit metal complex compounds over catalytically active substrate surfaces in flowing gases at ambient pressure. Thus, metallic thin films of Fe, Co and Cu were obtained on Ni substrate in a flowing hydrogen, whereas metal oxide films of these metals were obtained in a flowing oxygen. It is able to controll the chemical composition of the resulting film by changing the flowing gas. In addition a gradient film of Cu, which changed its chemical composition gradually from metal to Cu oxide, was obtained by changing the composition of flowing gas gradually from argon to oxygen. Such a film suggested high torelance against thermal shock.
埼玉大学分析センターの論文
1993-12-00