CVD法による鉛ガラス薄膜の特性<ミニノート>

概要

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A new fabrication method of silicon micro channel plate (MCP) by semiconductor microfabrication technologies has developed instead of conventional MCP using glass micro capillaries. This fabrication method stands on the technologies of chemical vapor deposition (CVD) to deposit electron multiplication films on the sufaces of the micro channels. The electron multiplication films are lead glass using tetra-ethyl lead and silicon tetra-ethoxide or silicon tatra-methoxide. The composition ratio of silicon and lead in the films changes according to a ratio of the flow rate of the supplied gas sources. The sheet resistance of the films depends on the film composision, annealing and hydrogen reduction conditions. A suitable sheet resistance for the application to MCP can be performed by controlling there conditions.
埼玉大学分析センターの論文