Ni蒸着膜における内部応力の入射角依存性

概要

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The internal stress in vapour-deposited Ni films has been studied as a function of the incidence angle of the evaprant. The main findings are as follows:1. The internal stress had a constant value for thickness between 0.1 and 0.6μm.2. The total stress decresed with increasing the incidence angle and the decreasing rate of the total stress had the maximum value at the incidence angle of 45°.3. The stress anisotropy increased with the increase of the incidence angle.4. The total stress tended to decrease with increasing the deposition rate for all incidence angles.
琉球大学教育学部の論文