Sub-nanometre Double Shearing Heterodyne Interferometry for Profiling Large Scale Planar Surfaces
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概要
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A novel interferometric method, called a double shearing interferometry, is presentedfor profiling large-scale quasi-planar surfaces, such as semiconductor wafers, optical flats andx-ray mirrors. The surface profile is measured even under existence of the inclination of ascanning stage. By adopting the common-path optical configuration and the heterodyne detection,the proposed method realizes excellent resolution in sub-nanometer order and enables a robustmeasurement against unwanted disturbances due to the measurement environments. A heightresolution of 0.1nm was experimentally achieved. A standard deviation of the analytical surfaceprofiles was found to be 1.3nm, even when using a conventional screw-lead scanning stage. Themeasured results show that the surface profile and stage inclination are separately determined.We confirmed resultant profile was well consistent with the one measured with Fizeauinterferometer.
- IOP Publishing Ltdの論文
- 2004-00-00
IOP Publishing Ltd | 論文
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