Identification of cesium effects on enhancement of H- production in a volume negative ion source

概要

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Effects of cesium vapor injection on H- production in a tandem source are studied theoretically and parametrically as a function of different surface processes. Model calculation is done by solving a set of particle balance equations in steady-state hydrogen discharge plasmas. By including H- surface production processes caused by H atoms or positive hydrogen ions, enhancement of H- production observed experimentally is reproduced in the model.
American Institute of Physicsの論文