G030071 ヘルツ接触を用いた薄膜剥離手法の検討([G03007]材料力学部門一般セッション(7):はく離と異材 )

概要

論文の詳細を見る
There are several methods to make a membrane of a shape memory alloy. The sputtering method is one of them. The purpose of this study is to detach thin film from basal plate by using of the hertz contact stress in sputtering, and its analysis is performed by simulation. First, we create a finite element model of basal plate, ball and thin film. As the first step, we compare theoretical value and analytical value, and examine whether the contact stress expression of hertz can be used at simulation. Also we examine the optimal boundary conditions for thin film delamination from stress and strain distribution. The analysis showed that the analytical value is almost identical with the theoretical one.
一般社団法人日本機械学会の論文
2011-09-11