ラマン分光法及びX線回折法を用いた太陽電池用シリコン薄膜の結晶性評価

概要

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Structural analyses on microcrystalline silicon (μc-Si) films for thin-film silicon solar cell applications prepared by plasma CVD method were studied. Raman spectroscopy and X-ray diffraction method (XRD) were used. The crystallinities of μc-Si films were decided by the intensity ratio in the separated peak of the Raman spectra. Grain size of <111> direction obtained by XRD increased as the crystallinity of the film increased. The crystalline face of μc-Si oriented <111> direction to the substrate. The distribution of c-Si in the film was evaluated Raman spectrum excited from the three kind of wavelength lasers which have the different penetration depth. We could show nondestructively that the crystallinity of film is increased as closing upon the front surface.
2009-09-30