Study of Amorphous Carbon Nitride Films Aiming at White LightEmitting Devices

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概要

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• The possibility for white light emitting devices using carbon nitride (CNx) thin films has been studied.Microwave ECR-plasma CVD and RF-sputtering apparatuses have been used for the formation of CNx thinfilms. In both cases, CH4 was used as the source or sub-source of carbon in order to investigate the effect ofhydrogenated carbon nitride for luminescence. The cathodeluminescence (CL) measurement of the film grownby ECR-plasma CVD method showed three peaks of R/G/B. The photoluminescence (PL) measurement of thefilm grown by RF-sputtering also showed the red peak, which could not be observed in the film withouthydrogen. Together with the X-ray Photoelectron Spectroscopy (XPS) analysis data, we concluded that the redpeak originates from C-H bonds and blue peak from C-N bonds.

• 津山工業高等専門学校の論文

著者

• 伊藤 國雄

  津山工業高等専門学校 電気電子工学科

• 伊藤 國雄

  津山工業高等専門学校

• 岩野 祐太

  津山工業高等専門学校

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• Study of Amorphous Carbon Nitride Films Aiming at White LightEmitting Devices

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