Fabrication and ionic conductivity of apatite-type Mg doped lanthanum silicate films by DC plasma spraying
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概要
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Dense films of Mg doped lanthanum silicate were deposited on Fe, stainless steel and lanthanum chromite substrates by atmospheric DC plasma spraying with an input energy of 44-21kW. Scanning electron microscopic observation showed that microstructure of the films on these substrates consists of densely piled up particles with a disk-like shape. The film deposited with the lowest input energy of 21kW includes a larger amount of smaller particles. Bulk ionic conduction was observed in the film deposited on lanthanum chromite substrates with an input energy of 38kW and annealed at above 1073K. On annealing at above 1173K the ionic conductivity measured at 973K rapidly increased up to 2mScm^<-1>, while the grain boundary resistance disappeared on annealing at above 1273K and the electrode interface resistance gradually increased with the annealing temperature. A mixture of amorphous and apatite phase in the as-deposited films turned to a single apatite phase after the annealing at 1273K.
- 社団法人日本セラミックス協会の論文
- 2009-01-01
著者
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Yoshioka Hideki
Hyogo Prefectural Institute Of Technology
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Yoshioka Hideki
Hyogo Prefectural Institute Of Industrial Research
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