B-7 EFFECTS OF NATURE OF SUBSTRATE ON MICROSTRUCTURE OF ITO AND TIO_2 THIN FILMS GROWN BY RF SPUTTERING(Session: Thin films)

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概要

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• In this study, ITO and TiO_2 films were deposited on sodalime glass, NaCl(100) and silicon(111) wafer. Microstructure of the deposited films, before and after post-annealing at 400℃ and 500℃, was analyzed by XRD. It has been found that; i) ITO: as deposited plane (222) was recognized only on silicon and glass substrates. After annealing, planes (211), (400), (440), and (622) were also observed on all substrates. The relative ratios of (400)/(222) on silicon and NaCl substrates were higher than on glass. ii) TiO_2: as deposited no indication of preferred plane were found. After annealing, planes (101), (004), (200), (105) and (211) and (622) were observed on silicon while only plane (101) on NaCl, and no structure observed on glass.

• 一般社団法人日本機械学会の論文
• 2006-11-08

著者

• Dangtip Somsak

  Department Of Physics Mahidol University:center For Nanoscience And Nanotechnology Mahidol Universit

• Boonyopakorn Narong

  Department of Physics, Mahidol University

• Sripongpun Nitat

  Department of Physics, Mahidol University

• Thanachayanont Chanchana

  National Metal and Materials Technology

• Osotchan Tanakorn

  Department of Physics, Mahidol University

• Osotchan Tanakorn

  Department Of Physics Mahidol University:center For Nanoscience And Nanotechnology Mahidol University

• Boonyopakorn Narong

  Department Of Physics Mahidol University

• Sripongpun Nitat

  Department Of Physics Mahidol University

関連論文

• B-7 EFFECTS OF NATURE OF SUBSTRATE ON MICROSTRUCTURE OF ITO AND TIO_2 THIN FILMS GROWN BY RF SPUTTERING(Session: Thin films)

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