Rotatable Anisotropy in Films of Nickel
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概要
- 論文の詳細を見る
The nickel films which have been deposited at substrate temperature as low as room temperature possess the property of having a rotatable anisotropy. The anisotropy constant and rotational hysteresis loss vs. field were measured by use of an automatic recording torque meter in the temperature range between room temperature and liquid nitrogen temperature. Considering the results, a domain configuration model for the rotatable anisotropy is presented.
- 横浜国立大学の論文
著者
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Konno Hiroshi
Department Of Industrial Engineering And Management Tokyo Institute Of Technology
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Konno H.
Department of Physics, YOKOHAMA NATIONAL UNIVERSITY
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