Fabrication of Co-M-O (M = Ti, Al and Si) Granular Thin Films with Giant Magnetoresistance by Reactive Deposition Method (Short Note)
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概要
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Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O_2 beam at a highrate of 〜90nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3nm irrespective of the type of oxide matrix. The MR ratios in a field of 19kOe [MR_r(19kOe)] are found to be 3-9% and there was a tendency of MR_r(M = Si) < MR_r(Al) < MR_r(Ti). In particular, MR_r (M = Ti, 19kOe) was found to reach a large value of 9.3%. [DOI: 10.1143/JJAP.41.1347]
- 社団法人応用物理学会の論文
- 2002-03-15
著者
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Takeno Yukio
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Shimada Yutaka
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Shimada Yutaka
Institute For Agricultural Research Tohoku University
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