Photolithography and Selective Etching of an Array of Quartz Tuning Fork Resonators with Improved Impact Resistance Characteristics : Instrumentation, Measurement, and Fabrication Technology

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概要

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• Quartz tuning fork blanks with improved impact-resistant characteristics for use in Qualcomm mobile station modem (MSM)-3000 central processing unit (CPU) chips for code division multiple access (CDMA), personal communication system (PCS), and global system for mobile communication (GSM) systems were designed using finite element method (FEM) analysis and suitable processing conditions were determined for the reproducible precision etching of a Z-cut quartz wafer into an array of tuning forks. Negative photoresist photolithography for the additive process was used in preference to positive photoresist photolithography for the subtractive process to etch the array of quartz tuning forks. The tuning fork pattern was transferred via a conventional photolithographical chromium/quartz glass template using a standard single-sided aligner and subsequent negative photoresist development. A tightly adhering and pinhole-free 600/2000A chromium/gold mask was coated over the developed photoresist pattern which was subsequently stripped in acetone. This procedure was repeated on the back surface of the wafer. With the protective metallization area of the tuning fork geometry thus formed, etching through the quartz wafer was performed at 80℃ in a ±1.5℃ controlled bath containing a concentrated solution of ammonium bifluoride to remove the unwanted areas of the quartz wafer. The quality of the quartz wafer surface finish after quartz etching depended primarily on the surface finish of the quartz wafer prior to etching and the quality of quartz crystals used. Selective etching of a 100μm quartz wafer could be achieved within 90min at 80℃. A selective etching procedure with reproducible precision has thus been established and enables the photolithographic mass production of miniature tuning fork resonators.

• 社団法人応用物理学会の論文
• 2001-08-15

著者

• Lee S

  Department Of Electrical Engineering Kyungsung University

• LEE Sungkyu

  Department of Molecular Science and Technology, Ajou University

• Lee Sungkyu

  Department Of Molecular Science And Technology Ajou University

関連論文

• Photolithography and Selective Etching of an Array of Quartz Tuning Fork Resonators with Improved Impact Resistance Characteristics : Instrumentation, Measurement, and Fabrication Technology
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• Photolithography and Selective Etching of an Array of Surface Mount Device 32.768 Khz Quartz Tuning Fork Resonators : Definition of Side-Wall Electrodes and Interconnections Using Stencil Mask : Instrumentation, Measurement, and Fabrication Technology

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