非線型の表面反応を示す系に対するカバレッジのシミュレーション

概要

論文の詳細を見る
Step coverage simulation code was newly developed. This code, which is a kind of test particle Monte Carlo method, can simulate the step coverage with non-liner surface reaction, for example Tungsten (W) thermal Chemical Vapor Deposition (CVD) using hydrogen (H_2) and hexafluoro Tungsten (WF_6). The availability of this code was examined by the comparison of the experimental obtained step coverage and simulated one through W-CVD. The simulation results well explained the WF_6 concentration dependency of step coverage of W film grown on the silicon substrate. The step coverage of film grown at 773K and in low WF_6 concentration becomes poor coverage, however the film grown in high WF_6 concentration shows good coverage. Under high WF_6 concentration, the growth rate reaches the ceiling, namely the growth rate have the same value on the any position in the trench, and consequently the step coverage became good.
九州大学の論文
1998-07-31