アトミックトランスポート機構に依存する銅の自己拡散パラメーター(II. 放射化学)

概要

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The self-diffusion coefficients of Cu in copper single crystals in the temperature range from 980 K to 1351 K were determined by the serial sectioning method using the self-made tracer ^<67>Cu. The temperature dependence is expressed by D = 2.62×10^<-5> exp(-199 kJmol^<-1>/RT) m^2/s. A slight curvature was observed in the Arrhenius plot of the self-diffusion coefficients near the melting of copper. The result was analyzed using the monovacancy-divacancy model, showing that the contribution of divacancy to the self-diffusion in copper at high temperature range near the melting of copper cannot be ignored. The self-diffusion coefficients in the present work were compared with the other copper self-diffusion works for volume diffusion, grain boundary diffusion, surface diffusion, diffusion in nanocrystal and liquid of copper.
東北大学の論文