Loss Reduction of GeO_2-Doped Silica Waveguide with High Refractive Index Difference by High-Temperature Annealing

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概要

• 論文の詳細を見る

• The effect of a GeO_2-doped core on high-temperature annealing has been investigated to reduce the propagation loss of a waveguide device with high refractive index difference(Δ). A SiO_2-GeO_2 waveguide core was prepared on a fused silica substrate by rf magnetron sputtering and reactive ion etching. With increasing the annealing temperature, the roughness of the core side-wall gradually disappears and the rectangular core gradually becomes rounded. The effect of smoothing and rounding the cores was a significant reduction of the scattering loss, and moreover, it enabled the complete embedding of narrow gaps between cores in cladding glass using conventional plasma chemical vapor deposition. The propagation loss of the waveguide with a Δ of 1.5% was 0.07dB/cm at 1.55μm wavelength, the effect of which was demonstrated in the fabrication of an arrayed-waveguide grating demultiplexer.

• 社団法人応用物理学会の論文
• 2000-06-01

著者

• OKANO Hiroaki

  Optoelectoronic System Laboratory, Hitachi Cable, Ltd.

• TAKEUCHI Manabu

  Graduate School of Materials Science, Nara Institute of Science and Technology

• Okano H

  Hitachi Cable Ltd. Ibaraki Jpn

• Takeuchi Manabu

  Graduate School Of Science And Engineering Ibaraki University

• KASHIMURA Seiichi

  Graduate School of Science and Engineering, Ibaraki University

• MARU Koichi

  Optoelectronic System Laboratory, Hitachi Cable Ltd.

• Maru Koichi

  Optoelectronic System Laboratory Hitachi Cable Ltd.

• Kashimura Seiichi

  Graduate School Of Science And Engineering Ibaraki University

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• Fabrication and Characterization of Non-Doped SiO2 Cladding Layer for Polarization-Insensitive Silica Waveguide by Using Plasma Enhanced Chemical Vapor Deposition
• Wavelength Division Multi/Demultiplexer with Arrayed Waveguide Grating
• 2×N Optical Splitters Using Silica-Based Planar Lightwave Circuits (Special Issue On Devices, Packaging Technology, and Subsystems for the Optical Access Network)
• Loss Reduction of GeO_2-Doped Silica Waveguide with High Refractive Index Difference by High-Temperature Annealing
• Fabrication of Waveguide-Type Add/Drop Grating Filter by Radio-Frequency Magnetron Sputtering to Insert GeO_2-SiO_2 Cladding Layers
• Fabrication and Characterization of Non-Doped SiO2 Cladding Layer for Polarization-Insensitive Silica Waveguide by Using Plasma Enhanced Chemical Vapor Deposition
• Fabrication of Waveguide-Type Add/Drop Grating Filter by Radio-Frequency Magnetron Sputtering to Insert GeO2–SiO2 Cladding Layers

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