Electron Impact Mass Spectrometric Study of Vacuum-Deposited Nickel and Gold Films on Silicon Substrates
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概要
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An experimental electron impact ionization source is used with a mass spectrometer to determine the presence of various neutral atoms and molecules on nickel and gold films vacuum-deposited on silicon substrates. The mass peaks can be classified into three groups:monoenergetic, polyenergetic and combined. The groups are characterized by the peak shapes which depend on the ion sources. The major surface contaminants found on all samples are F, Na, Cl, K, CO and CO_2. The sources of some ions and their relative potential energies at the point of formation are determined by calculating the appearance potentials, from the mass peak shapes which are characteristic of this method, and by comparing these potentials with known appearance potentials.
- 社団法人応用物理学会の論文
- 1978-07-05
著者
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Yoon Ki
Department Of Biotechnology The University Of Tokyo
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Yoon Ki
Department Of Ceramic Engineering Yonsei University Seoul Korea
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