Piezoelectric Properties of ZnO Films on a Sapphire Substrate Deposited by an RF-Magnetron-Mode ECR Sputtering System
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概要
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Compared to conventional RF magnetron sputtering systems, electron cyclotron resonance (ECR) sputtering systems are characterized by the ability to generate high-density plasma under low gas pressure. (112^^-0)-plane oriented epitaxial ZnO films were deposited on an R-plane sapphire substrate using the RF-magnetron-mode ECR sputtering equipment. As the results of the measurement, the films showed a good orientation and excellent effective electromechanical coupling factors (k_<eff>) for the Rayleigh surface acoustic wave (SAW) and its high-order SAW waves. These coupling factors were equal to or higher than the theoretical values k_<eff> obtained by the finite element method (FEM) analysis using a single crystal material constant.
- 社団法人応用物理学会の論文
- 1998-05-30
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