Ar^+ Ion Bombardment Effect on Composition Variation in Ni-Fe Film Formed by Ion Beam Sputtering
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概要
- 論文の詳細を見る
This paper reports results of experimental investigations on composition variations in Ni-Fe films formed by ion beam sputtering. The composition variations, depending on both substrate angle and temperature, are caused by high energyAr^+ ions. The Ni fraction in Ni-Fe film and its deposition rate decrease as the ion current increases; this is because of preferential resputtering. Conversely, the Ni fraction increases as the substrate temperature increases without deposition rate change under Ar^+ ion bombardment; this has not previously been reported.
- 社団法人応用物理学会の論文
- 1985-04-20
著者
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Nagai Yasuhiro
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Nagai Yasuhiro
Ntt Electrical Communication Laboratories
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Toshima Tomoyuki
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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NISHIMURA Chikara
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Nishimura Chikara
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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