FEM Study of Low-Temperature Adsorption of Mixture of N_2 and O_2 on Tungsten

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概要

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• The adsorption of mixture of nitrogen and oxygen on tungsten surface at 80 K has been studied by the FEM method. The preferential adsorption of nitrogen is found to continue until a certain coverage is obtained. After the coverage the replacement of the adsorbed nitrogen by oxygen is found to occur and at last the oxygen-saturated surface is obtained. The coverage seems to be related to the saturation coverage of the atomical adsorption of nitrogen on tungsten at 80 K.

• 社団法人応用物理学会の論文
• 1982-03-05

著者

• Sato Mieko

  Electrotechnical Laboratory

• Sato Mieko

  Electrotechical Laboratory

関連論文

• FEM Observation of NO Adsorption on Tungsten
• FEM Study of Low-Temperature Adsorption of NO on Tungsten
• FEM Study of Low-Temperature Adsorption of Mixture of N_2 and O_2 on Tungsten
• Current-Pressure Characteristics of Ar Field Ion Source at High Pressures
• Field Emission Microscope Images of Oxygen Adsorption on Tungsten at 300 K and at Higher Coverages
• Patterns Around the (110) Plane of Field Emission Microscope Images of Tungsten Tips

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