Modulation-Doped In_<0.5>Al_<0.5>P/GaAs Field-Effect Transistors : Semiconductors and Semiconductor Devices
スポンサーリンク
概要
- 論文の詳細を見る
In_<0.5>Al_<0.5>P/GaAs modulation-doped field-effect transistors (MODFETs) have been fabricated to study the applicability of In_<0.5>(Ga_<1-x>Al_x)_<0.5>P/GaAs heterostructures to electronic devices. A DC transconductance of 250 ms/mm and a noise figure of 1.7 dB with associated gain of 10 dB at 12 GHz were obtained for a MODFET with a 0.25μm-long and 200μm-wide gate. Improvements in the performance are expected by A1-composition optimization for the InGaAlP. These results show the promising potential of In_<0.5>(Ga_<1-x>Al_x)_<0.5>P/GaAs MODFETs as high-frequency and high-speed devices .
- 社団法人応用物理学会の論文
- 1988-05-20
著者
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Ohba Yasuo
Research And Development Center Toshiba Corporation
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NAKANISI Takatosi
Research and Development Center, Toshiba Corporation
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Kawasaki Hisao
Research And Development Center Toshiba Corporation
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O. WATANABE
Research and Development Center, Toshiba Corporation
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KAMEI Kiyoo
Research and Development Center, Toshiba Corporation
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Nakanisi Takatosi
Research And Development Center Toshiba Corporation
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O. Watanabe
Research And Development Center Toshiba Corporation
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Kamei Kiyoo
Research And Development Center Toshiba Corporation
関連論文
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- Fabrication and Characterization of AlGaN/GaN Double-Heterolaser Structures on Sapphire Substrates Using Single Crystalline AIN Buffer Layers
- Modulation-Doped In_Al_P/GaAs Field-Effect Transistors : Semiconductors and Semiconductor Devices
- H-Atom Incorporation in Mg-Doped GaN Grown by Metalorganic Chemical Vapor Deposition
- Growth of High-Quality AlN, GaN and AlGaN with Atomically Smooth Surfaces on Sapphire Substrates
- Growth of High-Quality AlN and AlN/GaN/AlN Heterostructure on Sapphire Substrate