Critical Current Density and Its Hysteresis in Magnetic Field for Ba-Y-Cu-O Films Prepared by a Sputtering Technique

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-04-20

著者

• WATANABE Kazuo

  Institute for Materials Research, Tohoku University

• Muto Yoshio

  Institute For Materials Research Tohoku University

• FUJIMORI Hiroyasu

  Institute of Materials Research,Tohoku University

• MORITA Hiroaki

  Institute for Materials Research (Formerly The Research Institute for Iron, Steel and Other Metals),

• Fujimori H

  Tohoku Univ. Sendai

• WATAZAWA Keiichi

  Sumitomo Heavy Industries Ltd.

• Morita H

  Faculty Of Engineering Yamagata University

• Morita Hiroaki

  Institute For Materials Research Tohoku University

• Kobayashi N

  Institute For Materials Research Tohoku University Katahira

• Muto Y

  Institute For Materials Research Tohoku University

• Noto Koshichi

  Faculty of Engineering, Iwate University

• MURAKAMI Yoshitake

  Institute for Materials Research, Tohoku University

• KOYANAGI Yosuke

  Institute for Materials Research, Tohoku University

• Watanabe K

  National Institute For Fusion Science

• Watanabe Kazuo

  Institute For Materials Research Tohoku University

• Watanabe Kazuto

  Safety Assessment Department Chugai Pharmaceutical Co. Ltd.

• Muto Y

  The Institute For Materials Research Tohoku University

• Noto Koshichi

  Faculty Of Engineering Iwate Univ.

• Fujimori Hiroyasu

  Institute For Materials Research

• Koyanagi Yosuke

  Institute For Materials Research Tohoku University

• Muto Yoshio

  Institute For Materials Research (imr) Tohoku University

• Morita Hiroaki

  Institute For Materials Research

• Fujimori Hiroyasu

  Institute For Material Research Tohoku University

• WATANABE Kazuo

  Institute for Matererials Research, Tohoku University

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