Silicon Nitride Thin Films Young's Modulus Determination by am Optical Non Destructive Method

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概要

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• The purpose of our study is to determine the Young's modulus of silicon nitride (Si_3N_4) thin films. With respect to the experimental material, we use commercially available atomic force microscopy (AFM) microcantilevers. The novelty lies in the procedure used to compare and therefore to validate the experimental results. First, the fundamental mode of Si_3N_4 thin film microcantilevers is detected by means of the optical beam deflection (OBD)method. The resulting resonant frequency is subsequently introduced into the mechanical theoretical model toextract the value of the Young's modulus. A numerical modal analysis is performed to validate the experimental results using the same approach as that of the experiment. Finally, the Yotung's modulus obtained in this study is compared with those of other studies. The outcome shows that we have obtained a reliable protocol for Youg's modulus estimation.

• 社団法人応用物理学会の論文
• 1997-06-15

著者

• Fujita Hiroyuki

  Cnrs-iis Institute Of Industrial Science The University Of Tokyo

• BUCHAILLOT Lionel

  Laboratory for Integrated Micro-Mechatronic Systems, LIMMS

• FARNAULT Etienne

  CNRS-IIS, Institute of Industrial Science, The University of Tokyo

• HOUMMADY Moussa

  Laboratory for Integrated Micro-Mechatronic Systems, LIMMS

• Hoummady Moussa

  Laboratory For Integrated Micro-mechatronic Systems Limms

• Farnault Etienne

  Cnrs-iis Institute Of Industrial Science The University Of Tokyo

• Buchaillot Lionel

  Laboratory For Integrated Micro-mechatronic Systems Limms

関連論文

• Characterization of Sputtered TiNi Shape Memory Alloy Thin Films
• Silicon Nitride Thin Films Young's Modulus Determination by am Optical Non Destructive Method
• Two thin film shape memory alloy microactuators

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