100-K Operation of Al-Based Single-Electron Transistors
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概要
- 論文の詳細を見る
We have made Al-based single-electron transistors with an artificially fabricated 20-nm island electrode by utilizing standard electron-beam lithography and three-angle shadow evaporation. A periodic gate-voltage dependence of current at above 100 K is demonstrated with this device. In addition, we increased the charging energy about 20% by using anodization.
- 社団法人応用物理学会の論文
- 1996-11-01
著者
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NAKAMURA Yasunobu
NEC Fundamental Research Laboratories
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TSAI Jaw-Shen
NEC Fundamental Research Laboratories
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CHEN ChiiDong
NEC Fundamental Research Laboratories
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- Implementation of Single-Electron Transistor with Resistive Gate
- Observation of Coulomb Blockade in Resistively Coupled Single Electron Transistor
- 100-K Operation of Al-Based Single-Electron Transistors
- Individual Carrier Traps in GaAs/Al_xGa_As Heterostructures (Special Issue on Quantum Effect Devices and Their Fabrication Technologies)