Molecular Beam Epitaxy Study of Bi_2Sr_2CuO_x Using NO_2 as an Oxidizing Agent

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概要

• 論文の詳細を見る

• Molecular beam epitaxy (MBE) of Bi_2Sr_2CuO_x films has been studied using NO_2 as an oxidizing agent. The in situ RHEED and the XPS observations have shown that a two-dimensional layer of the Bi_2Sr_2CuO_x phase is formed on a SrTiO_3(100) surface even at 300℃ under 2×10^<-7> Torr of NO_2.

• 社団法人応用物理学会の論文
• 1990-07-20

著者

• Watanabe Shunji

  Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

• Hanada T

  Tokyo Univ. Agriculture Tokyo Jpn

• HANADA Takashi

  Research Laboratory of Engineering Materials, Tokyo Institute of Technology

• KAWAI Maki

  Research Laboratory of Engineering Materials

• Kawai Maki

  Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

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• Molecular Beam Epitaxy Study of Bi_2Sr_2CuO_x Using NO_2 as an Oxidizing Agent

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