X-Ray Orientation Topography
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概要
- 論文の詳細を見る
In order to observe orientation distribution in a single crystal, X-ray orientation topography has been devised by applying X-ray scattering radiography. A single crystal of iron-3% (wt) silicon alloy was examined to demonstrate the capability of the system. An accuracy of 20 arc seconds has been attained by the present apparatus with a spatial resolution of less than 48 μm.
- 社団法人応用物理学会の論文
- 1990-02-20
著者
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Chikaura Yoshinori
Department Of Applied Science For Integrated System Engineering Graduate School Of Engineering Kyush
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Takata Yoshihiro
Brewing Research Laboratories Sapporo Breweries Ltd.
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TAKATA Yoshihiro
Department of Physics, Faculty of Engineering, Kyushu Institute of Technology
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