Generation of a Surface-Wave-Enhanced Plasma Using Coaxial-Type Open-Ended Dielectric Cavity

概要

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A high-density and uniform plasma source which utilizes surface waves is described. Microwaves propagated through a coaxial waveguide are introduced circularly into the circumferential side of the dielectric disk, which is set at the open end of the coaxial-type cavity. A surface wave is launched from the dielectric surface and generates a plasma. The plasma density and electron temperature are 8×10^<11> cm^<-3> and 4.5 eV, respectively, at Ar gas pressure of 50 mTorr and microwave power of 800 W. The ashing rate without substrate heating of photoresist is 0.6 μm/min at the O_2 gas pressure of 50 mTorr and the microwave power of 500 W.
社団法人応用物理学会の論文
1995-08-15