Fourier Analysis of Interference Structure in X-Ray Specular Reflection from Thin Films
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概要
- 論文の詳細を見る
Interference oscillation observed in X-ray total external reflection from thin films was analyzed by the Fourier transform algorithm. The peak position in Fourier space was in good agreement with the layer thickness, and was defermined independently from the surface/interface roughness. The principle of the present technique and its application to SiO_2/Si thin films are shown. The advantages of the experiments using tunable synchrotron X-rays are also discussed.
- 社団法人応用物理学会の論文
- 1992-02-01
著者
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SAKURAI Kenji
National Institute for Materials Science (NIMS)
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Iida Atsuo
Photon Factory Institute Of Materials Structure Science
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Sakurai Kenji
National Research Institute For Metals
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Sakurai Kenji
National Institute For Materials Science
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