O_2 Gas Pressure Effects on Surface Morphology in Ferroelectric Bi_4Ti_3O_<12> Thin Films Fabricated by Spin-Coating Pyrolysis
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概要
- 論文の詳細を見る
Fabrication of ferroelectric Bi_4Ti_3O_<12> thin films was carried out by spin-coating pyrolysis of Bi and Ti naphthenates and successive heat treatments in O_2 gas. Heat treatments in O_2 gas were effective for fabrication of ferroelectric Bi_4Ti_3O_<12> thin films with c-axis orientation. It was confirmed that the film surface morphology strongly depends on the O_2 gas pressure. Smooth platelike grains of the size greater than 10×10 μm^2 formed extensively in thin films upon heat treatment at the O_2 gas pressure of 4.0×10^5 Pa. The film thickness was 500 nm. The thin film was a single phase of Bi_4Ti_3O_<12> completely oriented along the c-axis with good ferroelectric properties atroom temperature: coercive field of 15 kV/cm, remanent polarization of 1.9 μC/cm^2, dielectric constant of 43 and loss of 0.02.
- 社団法人応用物理学会の論文
- 1994-12-01
著者
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Kakimi A
Texas Instruments Tsukuba Res. And Dev. Center Ltd. Ibaraki Jpn
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Okamura S
Nara Inst. Sci. And Technol. (naist) Nara Jpn
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Okamura Soichiro
Department Of Applied Physics Faculty Of Science Science University Of Tokyo
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Tsukamoto Takeyo
Department Of Applied Physics Faculty Of Science Science University Of Tokyo
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Tsukamoto T
Department Of Applied Physics Tokyo University Of Science
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Tsukamoto T
Toshiba Corp. Kawasaki Jpn
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KAKIMI Atsushi
Department of Applied Physics, Faculty of Science, Science University of Tokyo
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Kakimi Atsushi
Department Of Applied Physics Faculty Of Science Science University Of Tokyo
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