Characterization of Sputtered TiNi Shape Memory Alloy Thin Films

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概要

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• The sputtering of TiNi polycrystalline alloys without and with a titanium mesh has been investigated for the development of shape memory alloy (SMA) micro-actuators. The thickness and composition distributions of TiNi thin films have been determined by Rutherford bakscattering spectroscopy (RBS). The composition of sputtered films was demonstrated to depend on the density of the titanium mesh and the distance from the target center, thus enabling easy fabrication of high and low temperature SMA actuator. The transition temperatures and resistivity have been measured with respect to the composition.

• 社団法人応用物理学会の論文
• 1999-12-15

著者

• Clerc Catherine

  Centre De Spectrometrie Nucleaire Et De Spectrometrie De Masse

• Le Pioufle

  Laboratory For Integrated Micro-mechatronic Systems (limms

• Fujita Hiroyuki

  Cnrs-iis Institute Of Industrial Science The University Of Tokyo

• Fujita Hiroyuki

  Cnrs-iis) Institute Of Industrial Science University Of Tokyo

• SURBLED Patrick

  Centre de Spectrometrie Nucleaire et de Spectrometrie de Masse

関連論文

• Characterization of Sputtered TiNi Shape Memory Alloy Thin Films
• Silicon Nitride Thin Films Young's Modulus Determination by am Optical Non Destructive Method

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