Magnetic and Crystallographical Characteristics of the Sendust Films formed by DC Opposite Sputtering Method
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概要
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Sendust films were formed using DC opposite sputtering equipment. Then, sputtering conditions that influence the magnetic and crystallographical characteristics of the films were studied. Sendust films with a low coercive force (< 1 Oe) and a high initial permeability (> 1000 at 6 MHz) are formed under the conditions of high sputtering gas pressures and high substrate temperatures. As the deposition rate increases, a higher substrate temperature is necessary to form film with low coercive forces. Superlattice formation and large columnar crystallites are found in the films formed at high sputtering gas pressures and high substrate temperatures; they decrease the coercive forces of the films.
- 社団法人応用物理学会の論文
- 1986-08-20
著者
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Noro Yoshihiko
Consumer Products Research Center Hitachi Lid.
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MIURA Michiyori
Consumer Products Research Center, Hitachi Lid.
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TANAKA Katsuyuki
Consumer Products Research Center, Hitachi Lid.
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Miura Michiyori
Consumer Products Research Center Hitachi Lid.
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Tanaka Katsuyuki
Consumer Products Research Center Hitachi Lid.
関連論文
- Magnetic and Crystallographical Characteristics of the Sendust Films formed by DC Opposite Sputtering Method
- Crystallographic Character of ZnO Thin Film Formed at Low Sputtering Gas Pressure
- Formation of Sendust Films by DC Opposite Sputtering Method