High Energy Electron Diffraction Study on Ionic Character of Amorphous SiO_2

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概要

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• The structure of amorphous SiO_2 film prepared by electron-beam evaporation has been investigated. The structural parameters of the shortest Si-O, O-O and Si-Si atomic pairs were determined from the radial distribution function by the least-squares method. Regarding the structural analysis of the evaporated amorphous SiO_2 (ev.a-SiO_2), the scattering factors for neutral and ionized atoms were used in order to investigate the ionic character of SiO_2. The obtained values for each atomic distance did not vary with the scattering factors used, but the obtained number of each atomic pair was greatly dependent on the factors. From the results of the structural parameters, it was found that ev.a-SiO_2 is constructed from basic silicate tetrahedrons, and that the constituent silicon and oxygen atoms have some ionic character.

• 社団法人応用物理学会の論文
• 1986-12-20

著者

• OHSAKI Hisashi

  Department of Physics, Faculty of Science, Osaka City University

• Ohsaki Hisashi

  Department Of Physics Faculty Of Science Osaka City University

• OHSAKI Hisashi

  Hokkaido Forest Products Research Institute

• Tada Masato

  Osaka Prefectural Technical College

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• Materialistic Difference in Macroscopic Friction Coefficients of Sputtered Metal Oxide Thin Films Deposited on Glass
• High Energy Electron Diffraction Study on Ionic Character of Amorphous SiO_2

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