Photoluminescence Study of GaAs-AlGaAs Multiquantum Well Grown by Molecular-Beam Epitaxy
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概要
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The spectral and spatial behaviors of the photoluminescence (PL) have been studied in GaAs-AlGaAs multiquantum well (MQW) structures grown by molecular-beam epitaxy at various substrate temperatures. The results indicate that the optimum substrate temperature is in the region of 660-700℃, where the PL intensity is a factor of 100 greater than that at lower temperatures. Interface disorder is observed by PL topography in a sample grown at temperatures higher than 750℃. This disorder is considered to degrade the PL intensities of samples grown above 750℃. The PL topographic observations show that dislocations and oval defects act as nonradiative centers and develop to dark-line defects under high optical excitation in MQW, as in conventional double heterostructures.
- 社団法人応用物理学会の論文
- 1986-01-20
著者
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Kobayashi K
Optoelectronics Joint Research Laboratory
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Kobayashi Keisuke
Optoelectronics Joint Research Laboratory
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NAKASHIMA Hisao
Optoelectronics Joint Research Laboratory
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OHTA Tuneaki
Optoelectronics Joint Research Laboratory
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