XPS Study of Thin Thermal Oxide Films on PbIn Alloys
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概要
- 論文の詳細を見る
Properties of the thermal oxide films of PbIn alloys have been studied by means of XPS. Prior to the oxidation, Ar sputtering and subsequent storage in UHV were carried out in order to relax the sputtering effect. The oxide films were then formed by exposing the alloys to O_2 for 30 minutes. Pb oxide and In oxide were determined to be PbO_x and In_2O_3 according to their XPS chemical shifts. By using angle resolved-XPS, PbO_x was found to exist in a small oxide layer. On the assumption that an oxide layer consists of an overlying PbO_x, layer and an underlying In_2O_3 layer, the thickness for each layer was also measured by XPS. The total oxide thickness has a maximum at In〜12 wt.% in alloy. The In_2O_3 volume fraction in oxide layer increases monotonically with an increase of In concentration in alloys, and PbO_x is formed only in the region below In〜30 wt.%.
- 社団法人応用物理学会の論文
- 1984-11-20
著者
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Hayashi Takayoshi
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Suzuki Mineharu
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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