A Stable In-Laboratory EXAFS Measurement System
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概要
- 論文の詳細を見る
An EXAFS measurement system with two proportional counters has been constructed. One of the counters is for monitoring the incident X-ray intensity, and the other is for measuring the intensity after the X-rays have passed through the specimen, and has an adjustable length. As the intensities before and after the specimen are measured simultaneously, the system is free from fluctuations of the incident X-ray intensity. By adjusting the length of the latter counter, error caused by the counting loss effect at the energy of the characteristic X-rays of impurities contained in the X-ray tube target has been removed. The EXAFS spectrum of Zn sites in amorphous Mg_<70>Zn_<30> alloy is measured with this system.
- 社団法人応用物理学会の論文
- 1983-02-20
著者
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Ito Masahisa
The Institute Of Physical And Chemical Research
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Iwasaki Hitoshi
The Institute Of Chemical And Physical Research (riken)
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Iwasaki Hitoshi
The Institute for Solid State Physics The University of Tokyo
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