Effect of Multiply Charged Ions on the Viekers Hardness of TiC Films

概要

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In previous experiments, TiN films or (Ti, AT)N films deposited by the high-voltage discharge method are found to exhibit good abrasion resistance properties or superior hardness. This effect is considered to be caused by multiply charged ions which are generated by the high-voltage discharge ; however, it may also be caused by the high ionization rate induced by the high-voltage discharge. The rate of ions arriving at the substrate area is measured by the change in the discharge voltage and the magnetic field. The rate at which ions come to the substrate is increased by forming a magnetic field, but not by an increase in the high-voltage discharge. Under both conditions, i.e., with and without a magnetic field, TiC films are deposited by the conventional method and by the high-voltage discharge method. Comparison of the Vickers hardness of these films is carried out. In both cases, films deposited by the high-voltage discharge method are harder than those obtained by the conventional method.
社団法人応用物理学会の論文
1999-02-15