Cleaning of Ge(110) Surfaces Using an Excimer Lamp
スポンサーリンク
概要
- 論文の詳細を見る
The formation of a GeO_2 overlayer on a Ge sample surface in the air and subsequent removal of the overlayer in ultrahigh vacuum is a newly developed method of cleaning Ge surfaces. Using an excimer lamp as an ultraviolet light source for the oxidation, we attempted to clean Ge(110), (111) and (100) surfaces and observed that well-reconstructed structures characteristic of clean surfaces appeared on the surfaces. Reflection high-energy electron diffraction observations immediately after the removal of the oxide overlayer suggest that the interface of the oxide overlayer and Ge(110) substrate is rough, but it is relatively smooth in the cases of Ge(111) and Ge(100) substrates.
- 社団法人応用物理学会の論文
- 1999-12-15
著者
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FUJII Hisashi
Kanagawa Industrial Technology Research Institute
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ICHIKAWA Toshihiro
Department of Earth and Environmental Sciences, Faculty of Science, Kagoshima University
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KUROKAWA Kiyotaka
Department of Physics, School of Science and Technology, Meiji University
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CHO Kohei
Department of Physics, School of Science and Technology, Meiji University
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Cho K
Department Of Physics School Of Science And Technology Meiji University
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Cho Kohei
Department Of Physics School Of Science And Technology Meiji University
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Kurokawa K
Department Of Physics School Of Science And Technology Meiji University
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Fujii Hisashi
Kanagawa Industrial Technology Center
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Ichikawa Toshihiro
Department Of Earth And Environment Science Faculty Of Science Kagoshima University
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