Sol-Gel Derived Epitaxial MgTiO_3 Thin Films

概要

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MgTiO_3 thin films have been successfully grown on a sapphire crystal by the sol-gel process. Epitaxial growth of MgTiO_3 thin films was obtained using magnesium acetylacetonate and titanium isopropoxide in the sol-gel process. In nonhydrolytic conditions, the c-axis oriented ilmenite structure of MgTiO_3 thin films developed at the crystallization temperatures 650-80O℃ with a 3-fold axis symmetry in the c-plane. These epitaxial MgTiO_3 thin films had extremely fine features in morphology, i.e., a fine grain size of 10-20 nm and a very smooth surface of 0.9 nm rms roughness. The epitaxial MgTiO_3 thin films exhibited a UV absorption edge at 280 nm and were transparent in the wavelength range of 400-1100 nm. The ordinary refractive index of the epitaxially grown MgTiO_3 thin films was 2.305, very close to the value of single-crystal MgTiO_3. This suggests that the epitaxially grown MgTiO_3 thin films are well crystallized and sufficiently strain-relaxed due to the small lattice mismatch with Al_2O_3 substrate.
社団法人応用物理学会の論文
1999-06-15