Optical Design of High-Performance Beam Lines for X-Ray Lithography

概要

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In this paper is presented an optical design of high-performance beam lines for synchrotron-radiation-based X-ray lithography. The optical system is composed of a single toroidal scanning mirror and a movable beryllium window whose motions are synchronized. The use of a toroidal scanning mirror is thought to cause excessive deformation of beam sharp during scanning and to suppress the light-condensing capacity. This problem has been solved by placing the rotating center of the mirror near the light source point. Thus, intense illumination power can be obtained. A beam reflected by the toroidal mirror forms an arc-shaped section, which causes nonuniformity in the exposure intensity. A beryllium window foil with a specific curvature can compensate the nonuniformity. A series of analytical studies and computer simulations have proven the performance of the optical design.
社団法人応用物理学会の論文
1999-06-15