Theoretical Investigation of Total Secondary Electron Yield for Teflon
スポンサーリンク
概要
- 論文の詳細を見る
The simplest physical model of the ≈1 eV-2.5 keV electron scattering in insulating polymers is proposed. The simulation of electron trajectories was performed using Monte Carlo technique. The integral characteristics of electron scattering such as total secondary electron yield and backscattering coefficients for Teflon were investigated for 50 eV-2.5 keV electron beams. The difference between theoretical and experimental data was within 50%.
- 社団法人応用物理学会の論文
- 1998-07-15
著者
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FUJII Haruhisa
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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HIRO Sanju
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Hiro Sanju
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Fujii Haruhisa
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Palov A
Mitsubishi Electric Corp. Hyogo Jpn
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PALOVA Alexandre
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Palova Alexandre
Advanced Technology R&d Center Mitsubishi Electric Corporation
関連論文
- Theoretical Investigation of Charge-Up Dynamics in Teflon Film Induced by Electron Beam
- Monte Carlo Simulation of 1 eV-35 keV Electron Scattering in Teflon
- Theoretical Investigation of Total Secondary Electron Yield for Teflon
- Charging of Glass Substrate by Plasma Exposure