Energy-Dispersive Grazing Incidence Diffraction with Synchrotron Radiation White X-Rays of Very Thin Polycrystalline Silicon Films
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概要
- 論文の詳細を見る
The precise alignment of the substrate-orientation in an energy-dispersive grazing incidence diffraction measurement with synchrotron-radiation white X-rays is used in the analysis of orientations of 50- to 10000-Å-thick low-pressure chemical-vapor deposited polycrystalline Si films on amorphous SiO_2 layers. The results reveal characteristic growth modes where the preferred orientation of grains is suppressed in the thickness range from 100 to 1000 Å, and where the orientation is determined by the effect of the initial island growth mode (i.e., the Volmer-Weber mode) when the thickness is less than 100 Å.
- 社団法人応用物理学会の論文
- 1997-09-15
著者
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Akimoto Koichi
Department of Applied Physics, Faculty of Engineering, University of Tokyo
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Akimoto K
Department Of Quantum Engineering Nagoya University
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Tanikawa A
Shichirigahama Senior High School Kanagawa Jpn
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TANIKAWA Akio
Microelectronics Research Laboratories, NEC Corporation
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