Optimization of Fabrication Parameters for Ge-Based Laminated Polarizer

概要

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Ge laminated polarizers (Ge-LAMIPOLs) consist of Ge/SiO_2 multilayers which are designed to absorb the TE mode of the light wave at 850 nm wavelength. Such Ge-LAMIPOLs facilitate the miniaturization of optical components, but they usually break during the fabrication processes because of their low mechanical strength. This problem is solved by insertion of Si binding layers at Ge and SiO_2 interfaces. Further improvement is also achieved by reduction of the internal stresses in SiO_2 layers, using the hydrogenation technique. The optical properties of the Ge-LAMIPOLs can be optimized by adjustment of the film deposition parameters. As the result, 250-μm-thick Ge/Si-LAMIPOLs with 54.0 dB extinction ratio and 0.37 dB insertion loss are successfully fabricated.
社団法人応用物理学会の論文
1994-09-15