Productiorn of RF Plasma Using a Magnetic Line-Cusp Field

概要

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A large-volume cylindrical rf plasma source with a magnetic line-cusp field has been developed for large-scale plasma processing. In this type of plasma source, a capacitively-coupled 13.56 MHz rf plasma is produced in the presence of a magnetic line-cusp field. Two versions of the plasma source have been designed and tested. The first version has peripheral rf electrodes placed outside the ionization chamber, and is suitable for preparing a large-volume uniform plasma. This plasma source can attain a useful area of uniform plasma over a 30-cm-diameter region within 10% nonuniformity. The second version features doughnut-shaped parallel plate electrodes which form part of the chamber wall and serve as high-current sources. The electron density in such a version is proportional to the rf power, being equal to 4×10^<10> cm^<-3> at 400 W. The measured electron-energy distribution function showed a Maxwellian distribution function due to the electron-neutral particle collisions arising from drift motion in the magnetic line-cusp field.
社団法人応用物理学会の論文
1994-03-15