Low-Temperature Microwave Plasma Etching of Crystalline Silicon

スポンサーリンク

概要

• 論文の詳細を見る

• Low-temperature microwave plasma etching of crystalline silicon is described. Vertical and lateral etch rates of Si and the selectivities of Si to photoresist are measured as a function of wafer temperature within a range of -150 to +30℃ for SF_6, CF_4, and NF_3. The results indicate that (1) dramatic reductions in lateral etch rate are obtained below -130℃, (2) vertical etch rates remain high up to 1.4 μm/min in the range of -140 to +30℃ for SF_6, and (3) the selectivities become high at low temperatures (e.g., > 40 at -90℃ and 2.3 Pa). This etching enables highly anisotropic Si etching at a high etch rate and high selectivity with fluoride gases. Less-polymerizing-type gases can provide high etch rates. An etching model of the ion-bombarded surfaces is discussed. The model implies that separate control of the side wall reaction and the horizontal surface reaction is achieved by the low-temperature etching.

• 社団法人応用物理学会の論文
• 1991-12-15

著者

• Tachi Shinichi

  Central Research Laboratory Hitachi Lid.

• Okudaira Sadayuki

  Central Research Laboratory Hitachi Limited

• Tsujimoto Kazunori

  Central Research Laboratory Hitachi Ltd

• TACHI Shinichi

  Central Research Laboratory, Hitachi, Lid.

• OKUDAIRA Sadayuki

  Central Research Laboratory, Hitachi, Lid.:(Present address)Device Development Center, Hitachi, Lid.

• TSUJIMOTO Kazunori

  Central Research Laboratory, Hitachi, Lid.

関連論文

• Low-Temperature Etching for Deep-Submicron Trilayer Resist
• Precise CD-Controlled Gate Etching Using UHF-ECR Plasma
• Mechanism of Radiation Damage in SiO_2/Si Induced by vuv Photons : Beam-Induced Physics and Chemistry
• Mechanism of Radiation Damage in SiO_2/Si Induced by vuv Photons
• Reduction in Microloading by High-Gas-Flow-Rate Electron Cyclotron Resonance Plasma Etching
• Electrical Properties of Focused-Ion-Beam Boron-Implanted Silicon
• Deposition in Dry-Etching Gas Plasmas
• Microwave Plasma Etching
• Low-Temperature Microwave Plasma Etching of Crystalline Silicon
• A Portable Double Focusing Mass Spectrometer

スポンサーリンク