Preparation of (Fe/Fe-N)/(Si-O) and (Fe/Fe-N)/(Si-N) Multilayered Films by Sputtering, ECR Plasma Nitridation and ECR Plasma CVD

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概要

• 論文の詳細を見る

• Structures and soft magnetic properties of (Fe/Fe-N)/(Si-O,-N) duplex structure multilayered films were studied. The films were prepared by alternation of Fe RF-sputtering, N_2 plasma nitridation and Si-O and Si-N electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD). Magnetic multilayers of Fe/Fe-N were magnetical1y isolated by 1 to 5 layers of nonmagnetic Si-O, -N to advance high-frequency permeability. High-frequency permeability was increased by lamination of Si-N layers, but Si-O lamination deteriorated soft magnetic properties of the Fe/Fe-N multilayers by oxygen contamination during the Si-O deposition process. At optimum lamination structure of (Fe/Fe-N)/(Si-N), μ^'>3500 (20 MHz) was obtained.

• 社団法人応用物理学会の論文
• 1992-04-15

著者

• MIYAGAWA Tsugio

  o Kawasaki Steel Corporation

• Fujinaga Masashi

  O Kawasaki Steel Corporation Technical Research Division:(present Address) Technical Research Divisi

• ONO Hideaki

  2nd Research Group, RIMES, Ltd., c

• YONEMOTO Takaharu

  2nd Research Group, RIMES, Ltd., c

• Ono Hideaki

  2nd Research Group Rimes Ltd. C

• Miyagawa T

  Riken Saitama Jpn

• Yonemoto Takaharu

  2nd Research Group Rimes Ltd. C

関連論文

• Growth of Bi/Sb Superlattice
• Epitaxial Growth of Bi/Sb Superlattice
• Preparation of (Fe/Fe-N)/(Si-O) and (Fe/Fe-N)/(Si-N) Multilayered Films by Sputtering, ECR Plasma Nitridation and ECR Plasma CVD

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