Numerical Analysis of Leakage Field Modulation for a Novel Direct Overwrite Medium
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概要
- 論文の詳細を見る
The numerical calculation of the leakage field in a novel laser-power modulation direct overwrite medium has been carried out. The medium had four functional layers: initializing layer, biasing layer, thermal isolating layer and storage layer. The leakage field applied to the storage layer was changed by the laser power. The degree of leakage field change and overwritable domain width, where the direction of an effective field applied to the storage layer could be modulated, were obtained as the figures of merit for overwriting performance. Si-N and Zr-O films were chosen as the thermal isolating layer in order to change the thermal response in the storage layer and the biasing layer. It has been found that the medium with a Si-N thermal isolating layer is suitable for overwriting and that leakage field modulation over 120 Oe was available within a domain width of 0.7 μm.
- 社団法人応用物理学会の論文
- 1992-02-28
著者
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Ashida S
Storage Materials And Devices Laboratory Corporate Research And Development Center Toshiba Corp.
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Kikitsu A
Materials And Devices Labs. R&d Center Toshiba Corp.
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Kikitsu Akira
Toshiba Corp. Corporate R&d Center
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ICHIHARA Katsutarou
Toshiba Research and Development Center
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ASHIDA Sumio
Toshiba Research and Development Center
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MIZUSAWA Yumi
Toshiba Research and Development Center
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Mizusawa Y
Toshiba Corp. R&d Center
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Ichihara K
Toshiba Corp. Kanagawa Jpn
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ASHIDA Sumio
Toshiba Corp., R&D center
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ICHIHARA Katsutarou
Toshiba Corp., R&D center
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MIZUSAWA Yumi
Toshiba Corp., R&D center
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