Optimization of Pupil Filters for Increased Depth of Focus

スポンサーリンク

概要

• 論文の詳細を見る

• The use of pupil filtering in optical lithography raises the question of an appropriate optimization method for such filters. We have suggested a pattern-independent procedure based on optimal energy concentration. Here, we discuss several different methods of implementing pupil filters in lithographic projection systems. We have assembled a simple telecentric test system and fabricated three filters optimized according to the suggested procedure. The results are shown to be in close agreement with predictions. We also present extensions of our calculations to large numerical apertures and non-unity magnification.

• 社団法人応用物理学会の論文
• 1993-12-30

著者

• OWEN Geraint

  Hewlett Packard Co.

• PEASE R.

  Stanford University

• Owen Geraint

  Hewlett-packard Co.

• Bunau Von

  Stanford University

関連論文

• The Effect of Gaps in Markle-Dyson Optics for Sub-Quarter-Micron Lithography
• Optimization of Pupil Filters for Increased Depth of Focus
• Demonstration of Secondary Electron Detection using Monolithic Multi-Channel Electron Detector

スポンサーリンク