Computational Studies on the Shape and Control of Plasmas in Magnetron Sputtering Systems
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概要
- 論文の詳細を見る
The three-dimensional motions of electrons are traced in magnetron sputtering systems. Electrons are emitted from a cathode and show drift motion. Collisions between electrons and neutral gas atoms of Ar are examined using the Monte Carlo method. The distribution of ionization points is used to show the shape of plasmas. The results of the simulations are as follows. The profiles of plasma distribution correspond to the shape of the magnetic field. The shape of erosion profile caused by sputtering agrees well with the plasma profile. The increase of ionization points is obtained by increasing the neutral gas pressure.
- 社団法人応用物理学会の論文
- 1993-12-15
著者
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Ido Shunji
Department Of Electrical Engineeing Faculty Of Engineering Saitama University
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Nakamura Koji
Department Of Community Preventive Medicine Niigata University Graduate School Of Medical And Dental
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Ido Shunji
Department Of Functional Material Science And Technology Faculty Of Engineering Saitama University
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Nakamura Koji
Department Of Functional Material Science And Technology Faculty Of Engineering Saitama University
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