Wave Propagation and Plasma Uniformity in am Electron Cyclotron Resonance Plasma Etch Reactor

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概要

• 論文の詳細を見る

• Wave propagation and absorption have been studied experimentally in an electron cyclotron resonance (ECR) plasma etch reactor operating at 2.45 GHz, with various microwave couplers. A coaxial rf probe was used to measure the wave amplitude along the reactor axis, and radial profiles of the plasma ion saturation current were determined by a Langmuir probe. A single mode whistler wave was detected, and wave absorption was found to occurat magnetic fields corresponding to an ECR frequency which is Doppler-shifted above the cold resonance. The radial uniformity of the plasma is strongly determined by the radial power distribution of the microwave coupler atlower magnetic fields where absorption occurs near the microwave window. Plasma radial transport alsoinfluences the resulting profile, especially for modes which are hollow in the center, such as the TM_<0.1>. Under conditions where the waves propagate from the window without absorption for several wavelengths, the waves refract towards regions of lower density where subsequent ionization tends to correct non-uniform plasma profiles. A model is presented and yields predictions which are in good agreement with the data. The model allows calculation of wave trajectories by ray-tracing techniques and includes simple plasma transport and power deposition.

• 社団法人応用物理学会の論文
• 1993-06-30

著者

• Stevens James

  Princeton University Department Of Chemical Engineering Princeton Plasma Physics Laboratory

• CECCHI Joseph

  Princeton University, Department of Chemical Engineering, Princeton Plasma Physics Laboratory

• Cecchi Joseph

  Princeton University Department Of Chemical Engineering Princeton Plasma Physics Laboratory

関連論文

• Wave Propagation and Plasma Uniformity in am Electron Cyclotron Resonance Plasma Etch Reactor

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