Pulse Shortening in the Duoplasmatron Type Ion Source

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概要

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• An arc pulsing method is widely used to obtain high intensity pulsed ion beams from the Duoplasmatron type ion source. In this method, it is found that anode current and, therefore, ion current pulse widths are smaller than voltage pulse width applied to the cathode. Factors affecting pulse shortening, such as gas pressure in discharge region, applied voltage, etc., have been investigated. Pulse shortening in ion beam current may be caused by the formation of the semispherical-shaped double electric layer, which focuses and accelerates electrons in plasma, near the cathode side of the capillary of the intermediate electrode.

• 社団法人応用物理学会の論文
• 1965-09-15

著者

• Tawara Hiroyuki

  Hitachi Research Laboratory Hitachi Ltd.

関連論文

• On Some Operating Features of Plasma Expansion Ion Source
• Pulse Shortening in the Duoplasmatron Type Ion Source
• Some Characteristics of a Duoplasmatron Ion Source

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